【个人资料】
姓名:王倩倩
职称:副研究员
邮箱:wangqq2021@sdu.edu.cn
研究方向:新型感光成像材料,光刻胶,微纳加工
【主要经历】
2023.08-至今山东大学国家胶体材料工程技术中心副研究员
2019.07-2023.07清华大学化学工程与技术博士后
2013.09-2019.06北京师范大学理学博士
2009.09-2013.06山东师范大学理学学士
【主要研究内容】
(1)聚合物化学放大光刻胶材料的制备及光刻工艺优化
(2)新型有机/无机感光成像材料的设计合成与光刻性能
(3)感光成像机理研究
【主要学术论文】
[13]Yana Guo, Shenshen Li, Haihua Wang, Yu Chen, Huan Chen, Dong Wang,Qianqian Wang*, Wenbing Kang*.High patterning photosensitivity by a novel fluorinated copolymer formulated resist.Eur.Polym.J.2024, 211, 113009.
[12]Junjun Liu, Dong Wang, Yitan Li, Haihua Wang, Huan Chen,Qianqian Wang*,Wenbing Kang*.Exceptionallithographysensitivityboosted byhexafluoroisopropanols inphotoresists.Polymers2024, 16, 6, 825.
[11]Tianqi Liu, Peipei Tao, Xiaolin Wang, Hongqing Wang, Minfei He,Qianqian Wang, Hao Cui, Jianlong Wang, Yaping Tang, Jin Tang, Ning Huang, Cuifang Kuang*, Hong Xu*,Xiangming He*.Ultrahigh-printing-speed photoresists for additive manufacturing.Nat.Nanotechnol.2024,19, 51–57.(荣获“中国光学十大进展”提名奖(应用研究类))
[10]Xubin Guo, Huan Chen, Haihua Wang, Dong Wang,Qianqian Wang*, Wenbing Kang*.Controlled in-situ reduction strategy for synthesis of transparent conductivemetal meshes using tannic acid-based photoresists.Microelectron. Eng.2024, 290, 112196.
[9]Qianqian Wang, Hao Cui, Xiaolin Wang, Ziyu Hu, Peipei Tao, Mingyang Li, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Exceptional light sensitivity by thiol−ene click lithography.J.Am.Chem.Soc.2023, 145(5), 3064-3074.(Selected asCoverPaper)
[8]Qianqian Wang#, Yuting Zhou#, Xiaolin Wang, Hongqiang Gao, Zhiwen Shu, Ziyu Hu, Peipei Tao, Yasin Ekinci, Michaela Vockenhuber, Yiqin Chen, Huigao Duan*, Hong Xu*, Xiangming He*. Suppressing of secondary electron diffusion for high-precision nanofabrication.Mater.Today2023, 67,95-105.
[7]Qianqian Wang, Michaela Vockenhuber, Hao Cui, Xiaolin Wang, Peipei Tao, Ziyu Hu, Jun Zhao, Jianlong Wang, Yasin Ekinci*, Hong Xu*, Xiangming He*. Theoretical insights into the solubility polarity switch of metal-organic nanoclusters for nanoscale patterning.Small Methods2023, 7(10), 2300309.(Selected as Front Cover)
[6]Peipei Tao,Qianqian Wang, Michaela Vockenhuber, Da Zhu, Tianqi Liu, Xiaolin Wang, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Yasin Ekinci*, Hong Xu*, Xiangming He*.Chargeshielding-orienteddesign of Zinc-basednanoparticleliquids forcontrollednanofabrication.J.Am.Chem.Soc.2023,145 (43), 23609-23619.
[5] Xiaolin Wang, Peipei Tao,Qianqian Wang, Rongbo Zhao, Tianqi Liu, Yang Hu, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Trends in photoresist materials for extreme ultraviolet lithography: A review.Mater.Today2023, 67,299-319.
[4] Ziyu Hu, Rongbo Zhao, Xiaolin Wang, Peipei Tao,Qianqian Wang, Yimeng Wang, Hong Xu*, Xiangming He*. Canny algorithm enabling precise offline line-edge roughness acquisition in high-resolution lithography.ACS Omega2023, 8, 3992-3997.(Selected asCoverPaper)
[3] Li Sheng,Qianqian Wang, Xiang Liu, Hao Cui, Xiaolin Wang, Yulong Xu, Zonglong Li, Li Wang, Zonghai Chen, Gui-Liang Xu, Jianlong Wang, Yaping Tang, Khalil Amine, Hong Xu*, Xiangming He*. Suppressing electrolyte-lithium metal reactivityviaLi+-desolvation in uniform nano-porous separator.Nat.Commun.2022, 13, 172.
[2]Qianqian Wang, Chenying Zhang, Chenfeng Yan, Fengjuan You, Liyuan Wang*. One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning.Eur.Polym.J.2019, 114, 11-18.
[1]Qianqian Wang, Chenfeng Yan, Fengjuan You, Liyuan Wang*. A new type of sulfonium salt copolymers generating polymeric photoacid: Preparation, properties and application.React.Funct.Polym.2018, 130, 118-125.
【已授权发明专利】
[1]黄俐研,王倩倩,李君,刘正平.一种制备聚苯乙烯/纳米银复合微球的方法, ZL201510830484.7.
[2]徐宏,何向明,王倩倩.光刻胶及亚胺类材料的图案化方法, ZL202010815574.X.
[3]徐宏,何向明,王倩倩.光刻胶、光刻胶的图案化方法及集成电路板的刻蚀方法, ZL202010811304.1.
[4]徐宏,何向明,王倩倩.光刻胶组合物、用它形成光刻图案的方法及其用途, ZL202010811408.2.