【个人资料】
姓名：王倩倩
职称：副研究员
邮箱：wangqq2021@sdu.edu.cn
研究方向：感光成像材料，光刻胶，微纳加工
【教育/工作经历】
(1) 2023-08至 今,山东大学,国家胶体材料工程技术研究中心,副研究员
(2) 2019-07至2023-07,清华大学，核能与新能源技术研究院，博士后
(3) 2013-09至2019-06,北京师范大学,化学学院，高分子化学与物理,博士
(4) 2009-09至2013-06,山东师范大学,化学化工与材料科学学院，化学,学士
【主要研究内容】
1.聚合物化学放大光刻胶材料的制备及光刻工艺优化
2.新型有机/无机感光成像材料的设计合成与光刻性能
3.感光成像机理研究
4.光引发剂、光致产酸剂的制备及性质
【主持科研项目】
1.国家自然科学基金青年基金，2025.01-2027.12
2.山东省自然科学基金青年基金，2025.01-2027.12
3.企事业单位一般横向项目, 2024.01-2026.12
【学术论文】（#共同作者，*通讯作者）
1.Qianqian Wang,Hao Cui, Xiaolin Wang, Ziyu Hu, Peipei Tao, Mingyang Li, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Exceptional light sensitivity by thiol−ene click lithography.J.Am.Chem.Soc.2023, 145(5), 3064-3074.(Selected asCoverPaper)
2.Qianqian Wang#, Yuting Zhou#, Xiaolin Wang, Hongqiang Gao, Zhiwen Shu, Ziyu Hu, Peipei Tao, Yasin Ekinci, Michaela Vockenhuber, Yiqin Chen, Huigao Duan*, Hong Xu*, Xiangming He*. Suppressing of secondary electron diffusion for high-precision nanofabrication.Mater.Today2023, 67,95-105.
3.Qianqian Wang, Michaela Vockenhuber, Hao Cui, Xiaolin Wang, Peipei Tao, Ziyu Hu, Jun Zhao, Jianlong Wang, Yasin Ekinci*, Hong Xu*, Xiangming He*. Theoretical insights into the solubility polarity switch of metal-organic nanoclusters for nanoscale patterning.Small Methods2023, 7(10), 2300309.(Selected as Front Cover)
4.Yana Guo, Shenshen Li, Haihua Wang, Yu Chen, Huan Chen, Dong Wang,Qianqian Wang*, Wenbing Kang*.High patterning photosensitivity by a novel fluorinated copolymer formulated resist.Eur.Polym.J.2024, 211, 113009.
5. Yue Liu, Dong Wang,Qianqian Wang*, Wenbing Kang*. Polymerizable nonionic perfluorinated photoacid generators for high-resolution lithography.Small Methods2024, 2400112.
6.Shenshen Li#, Jiaqi Li#, Huan Chen, Haihua Wang*,Qianqian Wang*, Wenbing Kang*. Graphite nitride carbon (g‑C3N4) and borates as near-UV heterogeneous photoinitiators for acrylate photopolymerization.ACS Appl. Polym. Mater.2024, 6, 8721−8726. (Selected as Front Cover)
7.Junjun Liu, Dong Wang, Yitan Li, Haihua Wang, Huan Chen,Qianqian Wang*,Wenbing Kang*.Exceptionallithographysensitivityboosted byhexafluoroisopropanols inphotoresists.Polymers2024, 16, 6, 825.
8.Xubin Guo, Huan Chen, Haihua Wang, Dong Wang,Qianqian Wang*, Wenbing Kang*.Controlled in-situ reduction strategy for synthesis of transparent conductive
metal meshes using tannic acid-based photoresists.Microelectron. Eng.2024, 290, 112196.
9.Qianqian Wang, Chenying Zhang, Chenfeng Yan, Fengjuan You, Liyuan Wang*. One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning.Eur.Polym.J.2019, 114, 11-18.
10.Qianqian Wang, Chenfeng Yan, Fengjuan You, Liyuan Wang*. A new type of sulfonium salt copolymers generating polymeric photoacid: Preparation, properties and application.React.Funct.Polym.2018, 130, 118-125.
11.Peipei Tao,Qianqian Wang, Michaela Vockenhuber, Da Zhu, Tianqi Liu, Xiaolin Wang, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Yasin Ekinci*, Hong Xu*, Xiangming He*.Chargeshielding-orienteddesign of Zinc-basednanoparticleliquids forcontrollednanofabrication.J.Am.Chem.Soc.2023,145 (43), 23609-23619.
12.Li Sheng,Qianqian Wang, Xiang Liu, Hao Cui, Xiaolin Wang, Yulong Xu, Zonglong Li, Li Wang, Zonghai Chen, Gui-Liang Xu, Jianlong Wang, Yaping Tang, Khalil Amine, Hong Xu*, Xiangming He*. Suppressing electrolyte-lithium metal reactivityviaLi+-desolvation in uniform nano-porous separator.Nat.Commun.2022, 13, 172.
13.Xiaolin Wang, Peipei Tao,Qianqian Wang, Rongbo Zhao, Tianqi Liu, Yang Hu, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Trends in photoresist materials for extreme ultraviolet lithography: A review.Mater.Today2023, 67,299-319.
14.Tianqi Liu, Peipei Tao, Xiaolin Wang, Hongqing Wang, Minfei He,Qianqian Wang, Hao Cui, Jianlong Wang, Yaping Tang, Jin Tang, Ning Huang, Cuifang Kuang*, Hong Xu*,Xiangming He*.Ultrahigh-printing-speed photoresists for additive manufacturing.Nat.Nanotechnol.2024,19, 51–57.（荣获“中国光学十大进展”提名奖（应用研究类））
15.Ziyu Hu, Rongbo Zhao, Xiaolin Wang, Peipei Tao,Qianqian Wang, Yimeng Wang, Hong Xu*, Xiangming He*. Canny algorithm enabling precise offline line-edge roughness acquisition in high-resolution lithography.ACS Omega2023, 8, 3992-3997.(Selected asCoverPaper)
16.王倩倩,吴立萍,王菁,王力元*.嵌段共聚物的导向自组装.化学进展2017，29(4), 435-442.
【授权专利】
1.黄俐研,王倩倩,李君,刘正平.一种制备聚苯乙烯/纳米银复合微球的方法, ZL201510830484.7.
2.徐宏,何向明,王倩倩.光刻胶及亚胺类材料的图案化方法, ZL202010815574.X.
3.徐宏,何向明,王倩倩.光刻胶、光刻胶的图案化方法及集成电路板的刻蚀方法, ZL202010811304.1.
4.徐宏,何向明,王倩倩.光刻胶组合物、用它形成光刻图案的方法及其用途, ZL202010811408.2.
