姓名：王倩倩     

职称：副研究员

邮箱：wangqq2021@sdu.edu.cn

【教育及工作经历】

2023.08至今山东大学国家胶体材料工程技术中心 副研究员

2019.07-2023.07清华大学 博士后

2013.09-2019.06 北京师范大学 博士

2009.09-2013.06 山东师范大学 本科

【研究领域和兴趣】

半导体光刻胶；极紫外光刻；电子束光刻；紫外光刻；金属基光刻胶；有机系光刻胶

【发表科研成果】

学术论文

[1]Qianqian Wang, Hao Cui, Xiaolin Wang, Ziyu Hu, Peipei Tao, Mingyang Li, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Exceptional light sensitivity by thiol−ene click lithography.Journal of the American Chemical Society2023, 145, 3064-3074. (Selected as cover paper)

[2]Qianqian Wang¹, Yuting Zhou¹, Xiaolin Wang, Hongqiang Gao, Zhiwen Shu, Ziyu Hu, Peipei Tao, Yasin Ekinci, Michaela Vockenhuber, Yiqin Chen, Huigao Duan*, Hong Xu*, Xiangming He*. Suppressing of secondary electron diffusion for high-precision nanofabrication.Materials Today2023, accepted.

[3]Qianqian Wang, Michaela Vockenhuber, Hao Cui, Xiaolin Wang, Peipei Tao, Ziyu Hu, Jun Zhao, Jianlong Wang, Yasin Ekinci*, Hong Xu*, Xiangming He*. Theoretical insights into the solubility polarity switch of metal-organic nanoclusters for nanoscale patterning.Small Methods2023, 230030.

[4]Qianqian Wang,Chenying Zhang, Chenfeng Yan, Fengjuan You, Liyuan Wang*. One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning.European Polymer Journal2019, 114, 11-18.

[5]Qianqian Wang,Chenfeng Yan, Fengjuan You, Liyuan Wang*. A new type of sulfonium salt copolymers generating polymeric photoacid: Preparation, properties and application.Reactive&Functional Polymers2018, 130, 118-125.

[6]Li Sheng,QianqianWang, Xiang Liu, HaoCui, Xiaolin Wang,Yulong Xu, ZonglongLi, Li Wang, ZonghaiChen, Gui-Liang Xu,Jianlong Wang, YapingTang, Khalil Amine,Hong Xu*, XiangmingHe*. Suppressing electrolyte-lithium metal reactivityviaLi⁺-desolvation in uniform nano-porous separator.NatureCommunication2022, 13, 172.

[7]Xiaolin Wang, Peipei Tao,Qianqian Wang, Rongbo Zhao, Tianqi Liu, Yang Hu, Ziyu Hu, Yimeng Wang, Jianlong Wang, Yaping Tang, Hong Xu*, Xiangming He*. Trends in photoresist materials for extreme ultraviolet lithography: A review.Materials Today2023, accepted.

[8]Ziyu Hu, Rongbo Zhao, Xiaolin Wang, Peipei Tao,Qianqian Wang, Yimeng Wang, Hong Xu*, Xiangming He*. Canny algorithm enabling precise offline line-edge roughness acquisition in high-resolution lithography.ACS Omega2023, 8, 3992-3997. (Selected as cover paper)

[9] 王倩倩, 吴立萍, 王菁, 王力元*. 嵌段共聚物的导向自组装.化学进展 2017, 29, 435-442.

[10]崔昊,王倩倩, 王晓琳, 何向明*, 徐宏*. 面向极紫外：光刻胶的发展回顾与展望.应用化学2021,38, 1154-1167.

发明专利

[1]黄俐研,王倩倩,李君,刘正平.一种制备聚苯乙烯/纳米银复合微球的方法, ZL201510830484.7 (授权)

[2]徐宏,何向明,王倩倩.光刻胶及亚胺类材料的图案化方法, ZL202010815574.X.（授权）

[3]徐宏,何向明,王倩倩.光刻胶、光刻胶的图案化方法及集成电路板的刻蚀方法, ZL202010811304.1.（授权）

[4]徐宏,何向明,王倩倩.光刻胶组合物、用它形成光刻图案的方法及其用途, ZL202010811408.2.（授权）

[5]徐宏,何向明,王倩倩.光刻胶组合物及用它形成薄膜图案和阵列基板的方法, CN202010585054.4.